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- Yoshio NishiElectrical Engineering, Stanford UniversityVerified email at stanford.edu
- Michael T. NicholsDirector, Etch Technology, Applied MaterialsVerified email at amat.com
- Harsh SinhaVerified email at wisc.edu
- Brian C DalyVassar CollegeVerified email at vassar.edu
- He RenApplied Materials, IncVerified email at amat.com
- Nick KellerDirector of Applications, Onto InnovationVerified email at ontoinnovation.com
- Sean KingPrincipal EngineerVerified email at intel.com
- Nerissa DraegerLam ResearchVerified email at lamresearch.com
- Qinghuang LinDirector, Technology Development Center, ASML USVerified email at asml.com
- Arto NurmikkoProfessor of Engineering and Physics, Brown UniversityVerified email at brown.edu
- NCM FullerIBM Research, Bell Labs and Columbia UniversityVerified email at us.ibm.com
- Krishna NittalaApplied MaterialsVerified email at ufl.edu
- Shan Chebrown universtiyVerified email at brown.edu
- Samer BannaTechnion, Israel Institute of Technology, Applied MaterialsVerified email at amat.com
- David G. CahillDepartment of Materials Science and Engineering, University of Illinois at Urbana-ChampaignVerified email at illinois.edu
- R. SooryakumarProfessor of Physics, Ohio State UniversityVerified email at osu.edu
- Jeffry KelberUniversity of North TexasVerified email at unt.edu
- David B. GravesProfessor of Chemical and Biological Engineering, Princeton UniversityVerified email at princeton.edu
- Swayambhu P Behera, PhDUniversity of North Texas, Applied MaterialsVerified email at my.unt.edu
- Jengyi E. YuLam ResearchVerified email at lamresearch.com
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G. Andrew Antonelli
VP of Advanced R&D, Onto Innovation, Inc.
Verified email at ontoinnovation.com