Markku Leskela
Markku Leskela
Professor of Inorganic Chemistry, University of Helsinki
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Cited by
Cited by
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
V Miikkulainen, M Leskelä, M Ritala, RL Puurunen
Journal of Applied Physics 113 (2), 2013
Atomic layer deposition (ALD): from precursors to thin film structures
M Leskelä, M Ritala
Thin solid films 409 (1), 138-146, 2002
Atomic layer deposition chemistry: recent developments and future challenges
M Leskelä, M Ritala
Angewandte Chemie International Edition 42 (45), 5548-5554, 2003
Atomic layer deposition
M Ritala, M Leskelä
Handbook of Thin Films, 103-159, 2002
Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources
M Ritala, K Kukli, A Rahtu, PI Raisanen, M Leskela, T Sajavaara, ...
Science 288 (5464), 319-321, 2000
Atomic layer deposition of platinum thin films
T Aaltonen, M Ritala, T Sajavaara, J Keinonen, M Leskelä
Chemistry of materials 15 (9), 1924-1928, 2003
Handbook of thin film materials
M Ritala, M Leskela, HS Nalwa
Deposition and processing of thin films 1, 103, 2002
Method of depositing rare earth oxide thin films
J Niinistō, M Putkonen, M Ritala, P Räisänen, A Niskanen, M Leskelä
US Patent 6,858,546, 2005
Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition
M Ritala, M Leskelä, JP Dekker, C Mutsaers, PJ Soininen, J Skarp
Chemical Vapor Deposition 5 (1), 7-9, 1999
Thin Film Deposition Methods for CuInSe 2 Solar Cells
M Kemell, M Ritala, M Leskelä
Critical Reviews in Solid State and Materials Sciences 30 (1), 1-31, 2005
Growth of titanium dioxide thin films by atomic layer epitaxy
M Ritala, M Leskelä, E Nykänen, P Soininen, L Niinistö
Thin Solid Films 225 (1-2), 288-295, 1993
Atomic layer deposition of noble metals and their oxides
J Hämäläinen, M Ritala, M Leskelä
Chemistry of Materials 26 (1), 786-801, 2014
Atomic layer epitaxy-a valuable tool for nanotechnology?
M Ritala, M Leskelä
Nanotechnology 10 (1), 19, 1999
Molecular tweezers for hydrogen: synthesis, characterization, and reactivity
V Sumerin, F Schulz, M Atsumi, C Wang, M Nieger, M Leskela, T Repo, ...
Journal of the American Chemical Society 130 (43), 14117-14119, 2008
A frustrated-Lewis-pair approach to catalytic reduction of alkynes to cis-alkenes
K Chernichenko, Á Madarász, I Pápai, M Nieger, M Leskelä, T Repo
Nature chemistry 5 (8), 718-723, 2013
Facile heterolytic H2 activation by amines and B (C6F5) 3
V Sumerin, F Schulz, M Nieger, M Leskelä, T Repo, B Rieger
Angewandte Chemie International Edition 47 (32), 6001-6003, 2008
WO3 photocatalysts: Influence of structure and composition
IM Szilágyi, B Fórizs, O Rosseler, Á Szegedi, P Németh, P Király, ...
Journal of catalysis 294, 119-127, 2012
Synthesis and use of precursors for ALD of group VA element containing thin films
V Pore, T Hatanpää, M Ritala, M Leskelä
US Patent 10,208,379, 2019
Ruthenium thin films grown by atomic layer deposition
T Aaltonen, P Alen, M Ritala, M Leskelä
Chemical Vapor Deposition 9 (1), 45-49, 2003
Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
K Väyrynen, M Ritala, M Leskelä
US Patent 10,468,261, 2019
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