| Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends V Miikkulainen, M Leskelä, M Ritala, RL Puurunen Journal of Applied Physics 113 (2), 2013 | 1698 | 2013 |
| Atomic layer deposition (ALD): from precursors to thin film structures M Leskelä, M Ritala Thin solid films 409 (1), 138-146, 2002 | 1515 | 2002 |
| Atomic layer deposition chemistry: recent developments and future challenges M Leskelä, M Ritala Angewandte Chemie International Edition 42 (45), 5548-5554, 2003 | 1380 | 2003 |
| Atomic layer deposition M Ritala, M Leskelä Handbook of Thin Films, 103-159, 2002 | 834 | 2002 |
| Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources M Ritala, K Kukli, A Rahtu, PI Raisanen, M Leskela, T Sajavaara, ... Science 288 (5464), 319-321, 2000 | 665 | 2000 |
| Atomic layer deposition of platinum thin films T Aaltonen, M Ritala, T Sajavaara, J Keinonen, M Leskelä Chemistry of materials 15 (9), 1924-1928, 2003 | 537 | 2003 |
| Handbook of thin film materials M Ritala, M Leskela, HS Nalwa Deposition and processing of thin films 1, 103, 2002 | 497 | 2002 |
| Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition M Ritala, M Leskelä, JP Dekker, C Mutsaers, PJ Soininen, J Skarp Chemical Vapor Deposition 5 (1), 7-9, 1999 | 465 | 1999 |
| Method of depositing rare earth oxide thin films J Niinistō, M Putkonen, M Ritala, P Räisänen, A Niskanen, M Leskelä US Patent 6,858,546, 2005 | 456 | 2005 |
| Thin Film Deposition Methods for CuInSe 2 Solar Cells M Kemell, M Ritala, M Leskelä Critical Reviews in Solid State and Materials Sciences 30 (1), 1-31, 2005 | 432 | 2005 |
| Growth of titanium dioxide thin films by atomic layer epitaxy M Ritala, M Leskelä, E Nykänen, P Soininen, L Niinistö Thin Solid Films 225 (1-2), 288-295, 1993 | 425 | 1993 |
| Atomic layer deposition of noble metals and their oxides J Hämäläinen, M Ritala, M Leskelä Chemistry of Materials 26 (1), 786-801, 2014 | 422 | 2014 |
| Atomic layer epitaxy-a valuable tool for nanotechnology? M Ritala, M Leskelä Nanotechnology 10 (1), 19, 1999 | 417 | 1999 |
| Molecular tweezers for hydrogen: synthesis, characterization, and reactivity V Sumerin, F Schulz, M Atsumi, C Wang, M Nieger, M Leskela, T Repo, ... Journal of the American Chemical Society 130 (43), 14117-14119, 2008 | 409 | 2008 |
| A frustrated-Lewis-pair approach to catalytic reduction of alkynes to cis-alkenes K Chernichenko, Á Madarász, I Pápai, M Nieger, M Leskelä, T Repo Nature chemistry 5 (8), 718-723, 2013 | 407 | 2013 |
| WO3 photocatalysts: Influence of structure and composition IM Szilágyi, B Fórizs, O Rosseler, Á Szegedi, P Németh, P Király, ... Journal of catalysis 294, 119-127, 2012 | 406 | 2012 |
| Facile heterolytic H2 activation by amines and B (C6F5) 3 V Sumerin, F Schulz, M Nieger, M Leskelä, T Repo, B Rieger Angewandte Chemie International Edition 47 (32), 6001-6003, 2008 | 403 | 2008 |
| Ruthenium thin films grown by atomic layer deposition T Aaltonen, P Alen, M Ritala, M Leskelä Chemical Vapor Deposition 9 (1), 45-49, 2003 | 392 | 2003 |
| Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films M Ritala, M Leskela, L Niinisto, P Haussalo Chemistry of materials 5 (8), 1174-1181, 1993 | 389 | 1993 |
| Synthesis and use of precursors for ALD of group VA element containing thin films V Pore, T Hatanpää, M Ritala, M Leskelä US Patent 10,208,379, 2019 | 381 | 2019 |
