| Method for obtaining elliptical and rounded shapes using beam shaping EL Carpi US Patent 6,767,674, 2004 | 40 | 2004 |
| Alignment or overlay marks for semiconductor processing E Carpi, SH Zaidi US Patent 6,888,260, 2005 | 29 | 2005 |
| Method for the repair of defects in photolithographic masks for patterning semiconductor wafers SF Schulze, EL Carpi US Patent 7,150,946, 2006 | 8 | 2006 |
| Semiconductor manufacturing methods EL Carpi, SF Schulze US Patent 6,368,516, 2002 | 6 | 2002 |
| Extrusion enhanced mask for improving process window EL Carpi, S Butt US Patent 6,114,074, 2000 | 6 | 2000 |
| Mask alignment method E Carpi, B Liegl, P Thwaite US Patent App. 10/067,703, 2003 | 3 | 2003 |
| Intra-cell mask alignment for improved overlay EL Carpi, B Liegl US Patent 6,784,070, 2004 | 2 | 2004 |
| Pattern transfer in device fabrication B Liegl, J Preuninger, L Varnerin, G Williams, E Carpi, X Chen US Patent App. 10/065,956, 2004 | 2 | 2004 |
| Investigation of fast and accurate reticle defect assessment methods using STARlight for chrome-on-glass reticle defects IB Peterson, K Bhattacharyya, EL Carpi, D Brown, M Verbeek, DA Bernard Photomask and Next-Generation Lithography Mask Technology VII 4066, 338-347, 2000 | 2 | 2000 |
| Alignment system and method using bright spot and box structure EL Carpi, B Liegl, P Thwaite US Patent 6,801,314, 2004 | 1 | 2004 |
| Photomask registration specification and its impact on FLASH memory devices E Carpi, S Brown, F Tan, R Edwards 25th Annual BACUS Symposium on Photomask Technology 5992, 504-510, 2005 | | 2005 |
