| A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM A Vaid, BB Yan, YT Jiang, M Kelling, C Hartig, J Allgair, P Ebersbach, ... Metrology, Inspection, and Process Control for Microlithography XXV 7971, 21-40, 2011 | 74 | 2011 |
| Optical Detection of Electron Paramagnetic Resonance in Electron-Irradiated GaN C Bozdog, H Przybylinska, GD Watkins, V Harle, F Scholz, M Mayer, ... Phys. Rev. B 59, 12479, 1999 | 71 | 1999 |
| Intrinsic defects in GaN. I. Ga sublattice defects observed by optical detection of electron paramagnetic resonance KH Chow, LS Vlasenko, P Johannesen, C Bozdog, GD Watkins, A Usui, ... Phys. Rev. B 69, 5207, 2004 | 57 | 2004 |
| Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope A Vaid, BB Yan, YT Jiang, M Kelling, C Hartig, J Allgair, P Ebersbach, ... Journal of Micro/Nanolithography, MEMS and MOEMS 10 (4), 043016-043016-13, 2011 | 26 | 2011 |
| Electron Paramagnetic Resonance of Cu(d9) in GaN C Bozdog, KH Chow, GD Watkins, H Sunakawa, N Kuroda, U A. Phys. Rev. B 62, 12923, 2000 | 24 | 2000 |
| Hybrid metrology solution for 1X-node technology A Vaid, A Elia, M Kelling, J Allgair, C Hartig, P Ebersbach, E Mclellan, ... Metrology, Inspection, and Process Control for Microlithography XXVI 8324, 43-64, 2012 | 21 | 2012 |
| Hybrid metrology: from the lab into the fab A Vaid, A Elia, G Iddawela, C Bozdog, M Sendelbach, BC Kang, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (4), 041410-041410, 2014 | 18 | 2014 |
| Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets A Vaid, M Sendelbach, D Moore, TA Brunner, N Felix, P Rawat, C Bozdog, ... Journal of Micro/Nanolithography, MEMS and MOEMS 9 (4), 041306-041306-9, 2010 | 16 | 2010 |
| Defects Observed by Optical Detection of Electron Paramagnetic Resonance in Electron-irradiated P-type GaN LS Vlasenko, C Bozdog, GD Watkins, F Shahedipour, BW Wessels Phys. Rev. B 65, 205202, 2002 | 15 | 2002 |
| Advanced in-line metrology strategy for self-aligned quadruple patterning R Chao, M Breton, B L'herron, B Mendoza, R Muthinti, F Nelson, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 14 | 2016 |
| Scatterometry-based metrology for SAQP pitch walking using virtual reference T Kagalwala, A Vaid, S Mahendrakar, M Lenahan, F Fang, P Isbester, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 14 | 2016 |
| Implementation of hybrid metrology at HVM fab for 20nm and beyond A Vaid, L Subramany, G Iddawela, C Ford, J Allgair, G Agrawal, J Taylor, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 14 | 2013 |
| FTIR based nondestructive method for metrology of depths in poly silicon-filled trenches SH Zaidi, G Stojakovic, A Gutmann, C Bozdog, U Mantz, SB Charpenay, ... Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003 | 14 | 2003 |
| Product-driven material characterization for improved scatterometry time-to-solution A Vaid, C Hartig, M Sendelbach, C Bozdog, HK Kim, M Sendler, Y Cohen, ... Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 12 | 2009 |
| Method and system for determining strain distribution in a sample G Barak, S Wolfling, C Bozdog, M Sendelbach US Patent 10,209,206, 2019 | 10 | 2019 |
| Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference T Kagalwala, A Vaid, S Mahendrakar, M Lenahan, F Fang, P Isbester, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (4), 044004-044004, 2016 | 10 | 2016 |
| Measurement system and method for measuring in thin films C Bozdog, A Vaid, S Mahendrakar, M Hossain, T Kagalwala US Patent 10,030,971, 2018 | 9 | 2018 |
| Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA) R Muthinti, N Loubet, R Chao, J Ott, M Guillorn, N Felix, J Gaudiello, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 9 | 2016 |
| Hybrid approach to optical CD metrology of directed self-assembly lithography S Godny, M Asano, A Kawamoto, K Wakamoto, K Matsuki, C Bozdog, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 9 | 2013 |
| Optical Detection of Electron Paramagnetic Resonance in Low-dislocation-content GaN Grown by Hydride Vapor-Phase Epitaxy C Bozdog, GD Watkins, H Sunakawa, N Kuroda, U A. Phys. Rev. B 65, 125207, 2002 | 9 | 2002 |
Dr. Narender RanaTechnologist/Data Scientist, Western Digital CompanyVerified email at wdc.com
