| Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF hybrid plasmas using PECVD process BB SAHU, JG Han, KS Shin, K Ishikawa, M Hori, Y Miyawaki Plasma Sources Science and Technology 24, 025019, 2015 | 112* | 2015 |
| Langmuir probe and optical emission spectroscopy studies in magnetron sputtering plasmas for Al-doped ZnO film deposition BB Sahu, JG Han, M Hori, K Takeda Journal of Applied Physics 117 (2), 2015 | 56 | 2015 |
| Simultaneous enhancement of carrier mobility and concentration via tailoring of Al-chemical states in Al-ZnO thin films M Kumar, L Wen, BB Sahu, JG Han APPLIED PHYSICS LETTERS 106 (24), 241903, 2015 | 52 | 2015 |
| Flexible OLED fabrication with ITO thin film on polymer substrate SI Kim, KW Lee, BB Sahu, JG Han Japanese Journal of Applied Physics 54 (9), 090301, 2015 | 48 | 2015 |
| Study on the electrical, optical, structural, and morphological properties of highly transparent and conductive AZO thin films prepared near room temperature L Wen, BB Sahu, HR Kim, JG Han Applied Surface Science 473, 649-656, 2019 | 46 | 2019 |
| Advantage of dual-confined plasmas over conventional and facing-target plasmas for improving transparent-conductive properties in Al doped ZnO thin films L Wen, M Kumar, BB Sahu, SB Jin, C Sawangrat, K Leksakul, JG Han Surface and Coatings Technology 284, 85-89, 2015 | 44 | 2015 |
| Shaping thin film growth and microstructure pathways via plasma and deposition energy: a detailed theoretical, computational and experimental analysis BB Sahu, JG Han, H Kersten Phys. Chem. Chem. Phys. 19, 5591, 2017 | 37 | 2017 |
| Study of Plasma Properties for the Low-Temperature Deposition of Highly Conductive Aluminum Doped ZnO Film Using ICP Assisted DC Magnetron Sputtering BB Sahu, JG Han, JB Kim, M Kumar, S Jin, M Hori Plasma Processes and Polymers, 2015 | 36 | 2015 |
| A new structure for RF compensated Langmuir probes with external filters tunable in absence of plasma A Ganguli, BB Sahu, RD Tarey Plasma Sources Sci. Technol. 17 (1), 9, 2008 | 35 | 2008 |
| Development and characterization of a multi-electrode cold atmospheric pressure DBD plasma jet aiming plasma application BB Sahu, SB Jin, JG Han Journal of Analytical Atomic Spectrometry 32 (4), 782-795, 2017 | 32 | 2017 |
| Highly conductive flexible ultra thin ITO nanoclusters prepared by 3-D confined magnetron sputtering at a low temperature BB Sahu, W Long, JG Han Scripta Materialia 149, 98-102, 2018 | 31 | 2018 |
| Effectiveness of plasma diagnostic in ultra high frequency and radio frequency hybrid plasmas for synthesis of silicon nitride film at low temperature BB Sahu, KS Shin, SB Jin, JG Han, K Ishikawa, M Hori Journal of Applied Physics 116 (13), 2014 | 31 | 2014 |
| Integrated approach for low-temperature synthesis of high-quality silicon nitride flms in PECVD using RF–UHF hybrid plasmas BB Sahu, KS Shin, JG Han Plasma Sources Sci. Technol. 25, 015017, 2016 | 26 | 2016 |
| Experimental evidence of warm electron populations in magnetron sputtering plasmas BB Sahu, JG Han, HR Kim, K Ishikawa, M Hori Journal of Applied Physics 117 (3), 2015 | 26 | 2015 |
| Understanding Helicon Plasmas RD Tarey, BB Sahu, A Ganguli PHYSICS OF PLASMAS 19 (7), 11 (page 073520), 2012 | 26 | 2012 |
| Controlling conductivity of carbon film for L-929 cell biocompatibility using magnetron sputtering plasmas SI Kim, BB Sahu, SE Kim, A Ali, EH Choi, JG Han Journal of Materials Chemistry B 3 (16), 3267-3278, 2015 | 24 | 2015 |
| The role of plasma chemistry on functional silicon nitride film properties deposited at low-temperature by mixing two frequency powers using PECVD BB Sahu, YY Yin, T Tsutsumi, M Hori, JG Han Physical Chemistry and Chemical Physics 18, 13033, 2016 | 23 | 2016 |
| Investigation of absorption mechanisms in helicon discharges in conducting waveguides A Ganguli, BB Sahu, RD Tarey Plasma Sources Sci. Technol. 20 (1), 11, 2011 | 22 | 2011 |
| Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency plasma enhanced chemical vapor deposition BB Sahu, Y Yin, JG Han PHYSICS OF PLASMAS 23 (3), 033512, 2016 | 21 | 2016 |
| Warm electrons are responsible for helicon plasma production BB SAHU, A Ganguli, RD Tarey Plasma Sources Science and Technology 23, 065050, 2014 | 21 | 2014 |
