| New approaches to nanofabrication: molding, printing, and other techniques BD Gates, Q Xu, M Stewart, D Ryan, CG Willson, GM Whitesides Chemical reviews 105 (4), 1171-1196, 2005 | 2604 | 2005 |
| An introduction to lithography LF Thompson | 1228 | 1983 |
| Step and flash imprint lithography: a new approach to high-resolution patterning M Colburn, SC Johnson, MD Stewart, S Damle, TC Bailey, B Choi, ... Emerging Lithographic Technologies III 3676, 379-389, 1999 | 1060 | 1999 |
| Positive-and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone H Ito, CG Willson, JMJ Frechet US Patent 4,491,628, 1985 | 797 | 1985 |
| Chemical amplification in the design of dry developing resist materials H Ito, CG Willson Polymer Engineering & Science 23 (18), 1012-1018, 1983 | 731 | 1983 |
| Block copolymer lithography CM Bates, MJ Maher, DW Janes, CJ Ellison, CG Willson Macromolecules 47 (1), 2-12, 2014 | 650 | 2014 |
| Step and flash imprint lithography CG Willson, ME Colburn US Patent 6,334,960, 2002 | 567 | 2002 |
| High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire BJ DeKosky, GC Ippolito, RP Deschner, JJ Lavinder, Y Wine, ... Nature biotechnology 31 (2), 166-169, 2013 | 516 | 2013 |
| Step and flash imprint lithography: Template surface treatment and defect analysis T Bailey, BJ Choi, M Colburn, M Meissl, S Shaya, JG Ekerdt, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 512 | 2000 |
| Polarity-switching top coats enable orientation of sub–10-nm block copolymer domains CM Bates, T Seshimo, MJ Maher, WJ Durand, JD Cushen, LM Dean, ... Science 338 (6108), 775-779, 2012 | 440 | 2012 |
| Template for room temperature, low pressure micro-and nano-imprint lithography T Bailey, BJ Choi, M Colburn, SV Sreenivasan, CG Willson, J Ekerdt US Patent 6,696,220, 2004 | 422 | 2004 |
| Novel second‐order nonlinear optical polymers via chemical cross‐linking‐induced vitrification under electric field M Eich, B Reck, DY Yoon, CG Willson, GC Bjorklund Journal of applied Physics 66 (7), 3241-3247, 1989 | 416 | 1989 |
| Poly (p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins JMJ Frechet, E Eichler, H Ito, CG Willson Polymer 24 (8), 995-1000, 1983 | 372 | 1983 |
| Chemical amplification in high-resolution imaging systems SA MacDonald, CG Willson, JMJ Frechet Accounts of Chemical Research 27 (6), 151-158, 1994 | 330 | 1994 |
| Electrochromic and optical waveguide studies of corona-poled electro-optic polymer films RH Page, MC Jurich, B Reck, A Sen, RJ Twieg, JD Swalen, GC Bjorklund, ... JOSA B 7 (7), 1239-1250, 1990 | 329 | 1990 |
| Method for imprint lithography using an electric field SV Sreenivasan, RT Bonnecaze, CG Willson US Patent 6,908,861, 2005 | 246 | 2005 |
| Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications JD Cushen, I Otsuka, CM Bates, S Halila, S Fort, C Rochas, JA Easley, ... ACS nano 6 (4), 3424-3433, 2012 | 239 | 2012 |
| Highly efficient and stable nonlinear optical polymers via chemical cross‐linking under electric field D Jungbauer, B Reck, R Twieg, DY Yoon, CG Willson, JD Swalen Applied Physics Letters 56 (26), 2610-2612, 1990 | 235 | 1990 |
| Airborne chemical contamination of a chemically amplified resist SA MacDonald, NJ Clecak, HR Wendt, CG Willson, CD Snyder, CJ Knors, ... Advances in Resist Technology and Processing VIII 1466, 2-12, 1991 | 228 | 1991 |
| Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution CG Willson, H Ito, JMJ Fréchet, TG Tessier, FM Houlihan Journal of the Electrochemical Society 133 (1), 181, 1986 | 215 | 1986 |
