| Comparative study of thermally cured and electron-beam-exposed hydrogen silsesquioxane resists S Choi, MJ Word, V Kumar, I Adesida Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 75 | 2008 |
| The effects of molecular weight on the exposure characteristics of poly (methylmethacrylate) developed at low temperatures M Yan, S Choi, KRV Subramanian, I Adesida Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 55 | 2008 |
| Effects of developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense silicon nanowire fabrication S Choi, N Jin, V Kumar, I Adesida, M Shannon Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 41 | 2007 |
| Fabrication of triangular nanochannels using the collapse of hydrogen silsesquioxane resists S Choi, M Yan, I Adesida Applied Physics Letters 93 (16), 2008 | 36 | 2008 |
| Ultra-dense hydrogen silsesquioxane (HSQ) structures on thin silicon nitride membranes S Choi, M Yan, L Wang, I Adesida Microelectronic engineering 86 (4-6), 521-523, 2009 | 20 | 2009 |
| Effects of salty-developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense pattern transfer M Yan, J Lee, B Ofuonye, S Choi, JH Jang, I Adesida Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010 | 19 | 2010 |
| Ultradense gold nanostructures fabricated using hydrogen silsesquioxane resist and applications for surface-enhanced Raman spectroscopy S Choi, M Yan, I Adesida, KH Hsu, NX Fang Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 13 | 2009 |
| Nanometer-scale gaps in hydrogen silsesquioxane resist for -gate fabrication N Jin, S Choi, L Wang, G Chen, DH Kim, V Kumar, I Adesida Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 2 | 2007 |
| Investigation of surface roughness of poly (methylmethacrylate) developed at reduced temperatures M Yan, S Choi, J Lee, KRV Subramanian, I Adesida Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 1 | 2009 |
| Nanolithography and nanofabrication using hydrogen silsesquioxane resists SK Choi University of Illinois at Urbana-Champaign, 2009 | | 2009 |
