| Synthesis mechanism of MoS2 layered crystals by chemical vapor deposition using MoO3 and sulfur powders CM Hyun, JH Choi, SW Lee, JH Park, KT Lee, JH Ahn Journal of Alloys and Compounds 765, 380-384, 2018 | 47 | 2018 |
| Improved electrical performance of a sol–gel IGZO transistor with high-k Al2O3 gate dielectric achieved by post annealing E Lee, TH Kim, SW Lee, JH Kim, J Kim, TG Jeong, JH Ahn, B Cho Nano convergence 6, 1-8, 2019 | 46 | 2019 |
| Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited via atomic layer deposition using cyclopentadienyl-based precursors without annealing HB Kim, M Jung, Y Oh, SW Lee, D Suh, JH Ahn Nanoscale 13 (18), 8524-8530, 2021 | 26 | 2021 |
| Modulation of crystal structure and electrical properties of Hf0. 6Zr0. 4O2 thin films by Al-doping SW Lee, CM Kim, JH Choi, CM Hyun, JH Ahn Materials Letters 252, 56-59, 2019 | 17 | 2019 |
| Synthesis of Bi2Te3 Single Crystals with Lateral Size up to Tens of Micrometers by Vapor Transport and Its Potential for Thermoelectric Applications CM Hyun, JH Choi, SW Lee, SY Seo, MJ Lee, SH Kwon, JH Ahn Crystal Growth & Design 19 (4), 2024-2029, 2019 | 12 | 2019 |
| A simple strategy to realize super stable ferroelectric capacitor via interface engineering HB Kim, KS Dae, Y Oh, SW Lee, Y Lee, SE Ahn, JH Jang, JH Ahn Advanced Materials Interfaces 9 (15), 2102528, 2022 | 8 | 2022 |
| Effects of plasma conditions on sulfurization of MoO3 thin films and surface evolution for formation of MoS2 at low temperatures JH Choi, SW Lee, HB Kim, JH Ahn Applied Surface Science 532, 147462, 2020 | 8 | 2020 |
| Effects of Zr content and annealing on ferroelectricity of as-grown crystalline Hf1-xZrxO2 thin films using Hf [Cp (NMe2) 3] and Zr [Cp (NMe2) 3] precursors via atomic layer … Y Oh, HB Kim, SW Lee, MJ Jeong, TJ Park, JH Ahn Ceramics International 48 (17), 25661-25665, 2022 | 6 | 2022 |
| Low Power Switching Characteristics of CNT Field Effect Transistor Device with Al-Doped ZrHfO2 Gate Dielectric S Oh, SW Lee, D Kim, JH Choi, HC Chae, SM Choi, JH Ahn, B Cho Journal of Nanomaterials 2018, 2018 | 5 | 2018 |
| Polarization switching dynamics simulation by using the practical distribution of ferroelectric properties CJ Kim, JY Lee, M Ku, SW Lee, JH Ahn, BS Kang Applied Physics Letters 122 (1), 2023 | 2 | 2023 |
| Enhanced physical and electrical properties of HfO2 deposited by atomic layer deposition using a novel precursor with improved thermal stability SW Lee, H Kim, JH Ahn Surfaces and Interfaces 42, 103499, 2023 | 1 | 2023 |
| Yttrium Doping Effects on Ferroelectricity and Electric Properties of As-Deposited Hf1−xZrxO2 Thin Films via Atomic Layer Deposition Y Oh, SW Lee, JH Choi, SE Ahn, HB Kim, JH Ahn Nanomaterials 13 (15), 2187, 2023 | 1 | 2023 |
| Enhanced dielectric and energy storage performances of Hf0. 6Zr0. 4O2 thin films by Al doping SW Lee, MJ Jeong, Y Oh, HB Kim, TE Park, JH Ahn Ceramics International 49 (11), 18055-18060, 2023 | 1 | 2023 |
| Optimization Method for Conductance Modulation in Ferroelectric Transistor for Neuromorphic Computing CJ Kim, JY Lee, M Ku, TH Kim, T Noh, SW Lee, JH Ahn, BS Kang Advanced Electronic Materials 10 (5), 2300698, 2024 | | 2024 |
| Microscale spectroscopic mapping of defect evolution and filling in large-area growth of monolayer MoS2 T Lee, YG Yoon, SW Lee, JH Ahn, H Rho Applied Surface Science 637, 157885, 2023 | | 2023 |
| Implementation of rutile-TiO2 thin films on TiN without post-annealing through introduction of SnO2 and its improved electrical properties MJ Jeong, SW Lee, Y Shin, JH Choi, JH Ahn Surfaces and Interfaces 42, 103420, 2023 | | 2023 |
| Yttrium Doping Effects on Ferroelectricity and Electric Properties of As-Deposited Hf [sub. 1− x] Zr [sub. x] O [sub. 2] Thin Films via Atomic Layer Deposition. Y Oh, SW Lee, JH Choi, SE Ahn, HB Kim, JH Ahn Nanomaterials 13 (15), NA-NA, 2023 | | 2023 |
| Equivalent oxide thickness scalability of Zr-rich ZrHfO2 thin films by Al-doping MJ Jeong, SW Lee, HB Kim, Y Oh, JH Lee, JH Ahn Materials Letters 321, 132418, 2022 | | 2022 |
| Atomic layer deposited strontium niobate thin films as new high-k dielectrics SW Lee, HB Kim, CM Kim, SH Kwon, JH Ahn Materials Letters 286, 129220, 2021 | | 2021 |
| Low Temperature Growth of Wafer-Scale 2D MoS2 Thin Films By Pulsed Plasma-Enhanced Chemical Vapor Deposition JH Choi, SW Lee, HB Kim, MJ Ha, JH Ahn Electrochemical Society Meeting Abstracts prime2020, 1956-1956, 2020 | | 2020 |
